The D.I.S EBIS-C1 is an electron beam ion source featuring an ultra-compact design while still beingcapableofproducingbeam currentsofseveralhundredpAof multi-charged ionsofall gaseous elementsandcompounds. Themodularandoperator-friendly D.I.SEBIS-C1 is suitable for use inawide variety of applications for basic research in various scientificdisciplines, for teaching andtraining,andfortechnological applications.
- Product number
- 911-S7-09-00001
- Type of source
- CF40
- Flange
- CF40
- Ion current
- <1nA
- Final energy
- <1nA
- Energy feed
- electron gun
- Video
- Special features
- Ultra-compact, modularized electron beam ion source (EBIS) mounted on a DN40CF flange for easy integration into customized facilities
- Beam currents of several hundred picoamperes (pA) of multi-charged ions from all gaseous elements and compounds
- Ion generation for ion extraction and X-ray/UV/EUV spectroscopy
- Two cathode options with different diameters available depending on the field of application
- Wien filter module for ion charge state and mass selection
- Easily combinable with other charged particle beam-related devices
- Simple, cost-effective, and user-friendly access to the world of highly charged ions