Ion sources are an essential component of every ion beam facility and require the operator's highest attention. Therefore, each ion source offered by D.I.S Germany is based on many years of experience in the field of ion beam technology and benefits from the bundled competencies of D.I.S Germany and our partners in the United States.  


The highly modularized D.I.S EBIS-C1 setup allows the production of a wide variety of multi-charged ions. Therefore, it is an effective solution for a broad variety of applications.


The D.I.S ECRIS-2.45 is an ion source optimized for the production of ion beam currents of up to several hundreds of microamperes for a wide range of elements.